ModsEE3013
Semiconductor Devices Processing
The course will provide you with the basic concepts of the engineering principles behind semiconductor processing, wafer fabrication and physical principles underlying the operation of basic semiconductor devices. The contents of the course include the fundamentals of p-n diodes, bipolar devices, MOS devices, deposition techniques, diffusion and thermal oxidation, ion implantation, lithography and etching.
Contents: Fundamentals of Bipolar Devices. MOS Devices. Crystal growth and wafer preparation. Deposition Techniques. Diffusion and thermal oxidation. Ion implantation. Lithography. Etching.
Contents: Fundamentals of Bipolar Devices. MOS Devices. Crystal growth and wafer preparation. Deposition Techniques. Diffusion and thermal oxidation. Ion implantation. Lithography. Etching.
AUs | 3.0 AUs |
Exam | 28 November 2024, 1.00 pm - 03.00 pm |
Grade Type | N/A |
Maintaining Dept | N/A |
Prerequisites | EE2103 or |
Mutually Exclusive With | N/A |
Not Available To Programme | N/A |
Not Available To All Programme With | N/A |
Not available as Core for programmes | N/A |
Not Available as PE for programmes | N/A |
Not Available as BDE/UEs for programmes | MAT |
Not Offered To | N/A |
Total hours per week: 3 hrs
Available Indexes
Mon | Tue | Wed | Thu | Fri | |
---|---|---|---|---|---|
930 | 32104 TUT (EE01) 0930-1020 Thu TR+65 | ||||
1000 | |||||
1030 | 32105 TUT (EE02) 1030-1120 Tue TR102 | ||||
1100 | |||||
1130 | |||||
1200 | |||||
1230 | |||||
1300 | |||||
1330 | |||||
1400 | |||||
1430 | |||||
1500 | |||||
1530 | |||||
1600 | |||||
1630 | COMMON LEC (EELE) 1630-1820 Thu LT23 | ||||
1700 | |||||
1730 | |||||
1800 |
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Semiconductor Fundamentals
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