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This course discusses the basic principles underlying the fabrication of micro- and nanoelectronic devices and material processing techniques.
Semiconductor based device fabrication - ion implantation, diffusion, oxidation, epitaxy, thin film deposition, material and device characterization, lithography, etching and cleaning.
Conventional and non-conventional fabrication techniques of magnetic, organic and bioMEMS devices, and its characterization techniques will be discussed.
| AUs | 4.0 AUs |
| Grade Type | |
| Prerequisite | PAP232 |
| Exam |
| Mon | Tue | Wed | Thu | Fri | |
|---|---|---|---|---|---|
| 930 | |||||
| 1000 | |||||
| 1030 | |||||
| 1100 | |||||
| 1130 | |||||
| 1200 | |||||
| 1230 | |||||
| 1300 | |||||
| 1330 | |||||
| 1400 | |||||
| 1430 | |||||
| 1500 | |||||
| 1530 | |||||
| 1600 | |||||
| 1630 | |||||
| 1700 | |||||
| 1730 | |||||
| 1800 |
| Mon | Tue | Wed | Thu | Fri | ||
|---|---|---|---|---|---|---|
| 1430 | COMMON LEC (LE) 1430-1630 Wed SPMS-LT5 | |||||
| 1500 | ||||||
| 1530 | COMMON LEC (LE) 1530-1630 Mon SPMS-LT4 | |||||
| 1600 | ||||||
| 1630 | 73131 TUT (T1) 1630-1730 Mon LAB 05-12 Wk2-13 | 73132 TUT (T2) 1630-1730 Mon LAB 01-08 Wk2-13 | ||||
| 1700 | ||||||
