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ModsCH4341AY2024/2025 Semester 1

Fundamentals Of Intellectual Property In Chemical Eng

AY2024/2025 Semester 1

This course provides you with a working understanding on significant intellectual property (IP) protection regimes in Singapore, covering copyright, patents, registered design, trade marks and trade secrets and the relevant legislation and legal principles. The central aim of the course is providing students with the ability to identify, differentiate and apply various aspects of these IP regimes in connection with a business's intellectual asset outputs. Particular emphasis will be placed on the legal issues in relation to creation, protection, and exploitation of these intellectual assets. Within this context, the course explores how analysing IP rights protection laws and their considerations can guide a business's IP strategies, and how a business is able to use such IP considerations to assess the viability of potential courses of action and their plausible business implications. A note on the legal cases that are highlighted in the study units: these cases are for illustrative purposes in relation to the legal principles discussed; in general students are NOT expected to be able to recall them or use them in presenting arguments for assessment purposes.

AUs3.0 AUs
CategoriesCoreBDE
Not Available To ProgrammeACBS, ACC, ADM, AERO, AISC, ARED, ASEC, BACF, BASA, BCE, BCG, BMS, BS, BSB, BUS, CE, CEE, CEE 1, CEEC, CHIN, CMED, CNEL, CNLM, COMP, CS, CSC, CSEC, CVEC, ECON, EEE, EEE 1, EEEC, EESS, ELH, ELHS, ELPL, ENE, ENE 1, ENEC, ENG, HIST, HSCN, HSLM, IEEC, IEM, LMEL, LMPL, LMS, MACS, MAEC, MAT, MATH, ME 1, ME(DES), ME(IMS), ME(NULL), ME(RMS), MEEC(DES), MEEC(NULL), MEEC(RMS), MS, MS-2ndMaj/Spec(MSB), MTEC, PHIL, PHY, PLCN, PLHS, PPGA, PSY, REP(ASEN), REP(BIE), REP(CE), REP(CSC), REP(CVEN), REP(EEE), REP(ENE), REP(MAT), REP(ME), SCED, SOC, SPPE, SSM
Not Available To All Programme WithYr1, Yr2
Not Available As BDE/UE To ProgrammeREP(CBE)
Mutually Exclusive WithBG4341, MS4660
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